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腾讯网
12 天
俄自研EUV光刻机,打破ASML垄断,走出了一条新路
文/王新喜近日据芯智讯报道,俄罗斯自研出EUV光刻机。这一重大突破或将打破ASML在该领域的技术垄断,为全球半导体产业带来新的变革。EUV光刻机是制造先进芯片的关键设备,制造 EUV ...
新浪网
12 天
俄自研EUV光刻机,打破ASML垄断,走出了一条新路
我国氟化氩光刻机使用波长为193纳米的光源,而荷兰ASML的EUV光刻机使用波长为13.5纳米的光源,比DUV的光源要短14倍以上,其提供者就是美国Cymer公司 ...
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