Developing EUV lithography, however ... a high-reflectivity ellipsoidal molybdenum–silicon multilayer mirror collects and focuses the light from the plasma. As well as maximizing the power ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected ... This radiation is focused using high-quality zone plates and multilayer optics onto a back-illuminated CCD camera.

EUV, extreme ultraviolet lithography, is nearly completely associated with the Dutch company ASML, the only maker of EUV ...

LLNL maintains that this could lead to a next-generation “beyond EUV” (BEUV) lithography system producing chips that are smaller, more powerful, and faster to manufacture while using less electricity.

The light is carried by a set of lithography mirrors that are susceptible to heat. As for the photomask itself, it is made of ...