Nanowerk1 年
CMOS Technology Explained
Simplified process of fabrication of a CMOS inverter on p-type substrate in semiconductor microfabrication. Note: Gate, source and drain contacts are not normally in the same plane in real devices, ...
eeNews Europe2 小时
First nano-ridge GaAs lasers integrated into CMOS chip
The electrically-driven GaAs multi-quantum-well nano-ridge laser diodes are monolithically fabricated on 300mm silicon wafers ...
Nanowerk1 年
Chemical vapor deposition (CVD) and its role in semiconductor fabrication
LPCVD is often used for depositing high-quality, conformal films in CMOS fabrication. b. Atmospheric pressure CVD (APCVD): This process operates at atmospheric pressure and is generally simpler and ...
Nature9 天
Direct fabrication of lasers on silicon suggests solution to chip-production problem
Read the paper: GaAs nano-ridge laser diodes fully fabricated in a 300-mm CMOS pilot line The lasers ... They show that their fabrication process can install more than 300 functional laser devices ...
Engineering360 News6 年
Digital Integrated Circuit Design from VLSI Architectures to CMOS Fabrication
A top-down guide to the design of digital integrated circuits. Reflects industry design methods, moving from VLSI architecture design to CMOS fabrication. Practical hints and tips, case studies, and ...
来自MSN1 个月
Precisely-Doped Two-Dimensional Semiconductors For Monolithic Integrated Circuits
The compatibility of patterned doped 2H-MoTe 2 thin films with large-scale fabrication was demonstrated through the successful production of hundreds of CMOS inverter arrays on a centimeter-scale ...