Corning introduces new Extreme ULE glass for photomasks and mirrors to be used with next-generation EUV and High-NA EUV tools ...

Recently, the company introduced a groundbreaking material called EXTREME ULE Glass, poised to significantly enhance the semiconductor industry. This new type of glass is designed to meet the ...

Corning Incorporated GLW recently unveiled EXTREME ULE Glass - a next-generation material that aims to support chip ...

Corning designed EXTREME ULE ® Glass to withstand the highest intensity extreme ultraviolet (EUV) lithography, including high numerical aperture (High NA) EUV, which is rapidly becoming an industry ...

Corning has introduced its new ultra-low expansion (ULE) material that is designed to withstand ever increasing power of upcoming Low-NA (Numerical Aperture) and High-NA EUV lithography systems.

Corning® EXTREME ULE® Glass will help semiconductor industry leaders mass-produce leading-edge chips vital to advanced artificial intelligence technologies. Corning designed EXTREME ULE® Glass ...

Corning Incorporated GLW recently unveiled EXTREME ULE Glass - a next-generation material that aims to support chip manufacturers in addressing the escalating demand for advanced technologies.

Corning® EXTREME ULE® Glass will help semiconductor industry leaders mass-produce leading-edge chips vital to advanced artificial intelligence technologies. Corning Incorporated ...

Corning ® EXTREME ULE ® Glass will help semiconductor industry leaders mass-produce leading-edge chips vital to advanced artificial intelligence technologies. CORNING, N.Y., September 30, ...