TWINSCAN NXT:2000i - DUV lithography systems - ASML
The TWINSCAN NXT:2000i is a high-productivity, dual-stage immersion lithography tool designed for volume production of 300 mm wafers at advanced nodes. The system is equipped with an in-line catadioptric lens design, with a numerical aperture (NA) of 1.35 – the highest in the industry.
TWINSCAN NXT:2050i - DUV lithography machines - ASML
The TWINSCAN NXT:2050i is a high-productivity, dual-stage immersion lithography tool designed for volume production of 300 mm wafers at advanced nodes. Built on the future-proof NXT4 platform, our TWINSCAN NXT:2050i pushes overlay limits and offers unparalleled productivity for an immersion lithography system.
DUV lithography systems | Products - ASML
ASML’s most advanced KrF (krypton fluoride) laser 'dry' lithography system. This machine uses the latest NXT platform for volume 300 mm wafer production at and below 110 nm resolution. Designed using state-of-the-art optics for volume 200 and 300 mm wafer production at and below 110 nm resolution.
• NXT immersion system extensions for n5 nodes and beyond. Continuously extend on-scanner overlay and focus improvements. Solutions in place for cross-platform matching DUV to EUV. Various alignment- & focus-control and dose (laser power) packages available.
ASML Ships Twinscan NXT:2000i Scanner for 7nm and 5nm DUV - AnandTech
2018年8月2日 · ASML, the company known for producing equipment for the manufacture of processors and semiconductors at foundries, has started to ship its new Twinscan NXT:2000i DUV (Deep Ultra Violet)...
Model TWINSCAN NXT:2050i - High-Productivity, Dual-Stage …
The?TWINSCAN NXT:2050i is a high-productivity, dual-stage immersion lithography tool designed for volume production of 300 mm wafers at advanced nodes. 193 nm: ArF light source, ≤38nm: Resolution, 1.35NA: Projection optics, 295: Wafers per hour.
ASML Optics Lithography System TWINSCAN NXT:1950i
The TWINSCAN NXT:1950i introduces ASML's new generation of dual-scanning stages operating concurrently and independently. The innovative magnetic levitation technology allows significant acceleration and precision gain enabling the TWINSCAN NXT:1950i to achieve unprecedented productivity and overlay performance.
TWINSCAN NXT:1470 DUV Lithography - Environmental XPRT
With its outstanding overlay and throughput performance, this dual-stage ArF lithography tool helps chip manufacturers reduce cost per exposure while producing up to 50% more wafers from the same lithocell footprint.
ASML Ships New TWINSCAN NXT Immersion Lithography Platform
2015年9月29日 · Demonstrating 1.2 nanometer (nm) dedicated chuck overlay and better than 10 nm focus uniformity, the NXT:1980Di features new grid calibrations and hardware that enables chipmakers to achieve tighter process windows for next-generation process nodes.
ASML CEO says China is 10 to 15 years behind in chipmaking …
2024年12月25日 · However, ASML kept shipping advanced DUV lithography tools, such as the Twinscan NXT:2000i, which are capable of producing chips on 5nm and 7nm-class process technologies.
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